4 Inch [100] 0.001-0.005 OhmXcm silicon wafer 100nm oxide layer silicon wafers substrates
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Price from: | 65.80 $ |
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Description:4 Inch [100] 0.001-0.005 OhmXcm silicon wafer 100nm oxide layer silicon wafers substratesIntroducing our high-quality 4 Inch [100] Silicon Wafer with a 100nm oxide layer. This silicon wafer is designed to meet the demands of various technological applications, ensuring exceptional performance and reliability. With a resistivity range of 0.001-0.005 OhmXcm, this wafer provides excellent electrical conductivity, making it ideal for use in semiconductor devices and integrated circuits. The 4 Inch [100] Silicon Wafer boasts a precisely engineered oxide layer of 100nm. This oxide layer offers superior insulation properties, providing a reliable barrier between the silicon substrate and any subsequent layers or materials. This feature is crucial for preventing electrical leakage and ensuring the integrity of the circuitry. Whether you are working on research and development or industrial production, this wafer's oxide layer will enhance the efficiency and accuracy of your processes. Our silicon wafers substrates are meticulously manufactured to meet the highest industry standards. The [100] orientation of these wafers ensures optimal electrical performance while offering compatibility with a wide range of fabrication processes. The 4-inch diameter provides ample surface area for various applications, making it a versatile choice for your projects. Whether you are involved in microelectronics, optoelectronics, or nanotechnology, our silicon wafers substrates will empower you to achieve your goals with precision and reliability. In summary, our 4 Inch [100] Silicon Wafer with a 100nm oxide layer is a top-notch product designed to meet the |
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Digitální fotoaparát | Geolokace, IP location | Náramkové hodinky | LED žárovky | Minipočítače.cz | RC modely | Cheap Watch | Fotogalerie | Smartphone 1 | Burza domén | cooperate